Plasma etching of high-brightness LED programme
Date:2011-11-29 17:28
Status:Be resolved
Question:ningcuidi
used by injuries,oris likely to increase contact resistance. Etching process requires careful optimization to maximize throughput, while maintaining the performance of the device. Surface etching of high-quality smooth surface often.
　　Unoptimized etching process may result in GaN etching of dislocation, which in turn lead to increased surface pitting and contact resistance. Similarly, PR is the mask option in this step, because it is the most simple way to handle. Reportedly due to the typi
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