Plasma etching of high-brightness LED programme
Date:2011-11-29 17:28
Status:Be resolved
Question:ningcuidi
batch sizes from 4*2 inch 55*2 inch wafers up to todayor3*8 inches, its appeal, the question is now disappearing before it can process large batches. With wafer sizes from 2 inches to 4 English followed by a 6-inch upward migration, this problem has been resolved. GaN etch main field of application is light and high aspect ratio structures in contact etching etching.
4, light contact etching
When etch into the contact layer, minimum is of crucial importance to semiconductor plasma ca
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