Plasma etching of high-brightness LED programme
Date:2011-11-29 17:28
Status:Be resolved
Question:ningcuidi
erformance as shown in Figure 3, 600nm corrosion has been etched 4 microns deep, enabling high aspect ratio structures greater than 6:1. Vertical profiles of corrosion challenge here is to keep to ensure that the optical properties of Photonic crystals.


　　7, equipment


　　In order to meet the requirement of high etch rate and low damage, the industry has developed several high density plasma sources: inductively coupled plasma (ICP), transformer coupled plasma (TCP), high density plasma (H
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